CdTe Sputtering Target
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   CdTe Sputtering Target 2011-01-10 11:14:56   
   °ü¸®ÀÚ  ( 203.*.147.48 ) Á¶È¸ : 1050         
2"dia. x 0.250"(6.35mm) thickness, 99.999%(5N)Purity

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Total 59 °Ç
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59   Tellurium(Te) Evaporation Material °ü¸®ÀÚ 11-01-10 788
58   Calcium(Ca) Evaporation Material °ü¸®ÀÚ 11-01-10 774
57   Zinc(Zn) Sputtering Target °ü¸®ÀÚ 11-01-10 770
56   Germanium(Ge) Sputtering Target °ü¸®ÀÚ 11-01-10 873
55   Germanium(Ge) Powder °ü¸®ÀÚ 11-01-10 833
54   Germanium(Ge) Evaporation Material °ü¸®ÀÚ 11-01-10 795
  CdTe Sputtering Target °ü¸®ÀÚ 11-01-10 1051
52   Boron(B) Evaporation Material °ü¸®ÀÚ 11-01-10 1037
51   Tellurium(Te) Sputtering Target °ü¸®ÀÚ 11-01-10 795
50   Molybdenum(Mo) Powder °ü¸®ÀÚ 11-01-10 789
49   Aluminum(Al) Powder °ü¸®ÀÚ 11-01-10 1014
48   Arsenic(As) MBE Source °ü¸®ÀÚ 11-01-10 1001
47   Tungsten(W) Wire °ü¸®ÀÚ 11-01-10 803
46   Molybdenum(Mo) Rod °ü¸®ÀÚ 11-01-10 1021
45   CdS Sputtering Target °ü¸®ÀÚ 11-01-10 1031
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