CdTe Sputtering Target
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CdTe Sputtering Target
2011-01-10 11:14:56
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( 203.*.147.48 )
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: 1050
2"dia. x 0.250"(6.35mm) thickness, 99.999%(5N)Purity
Total 59 °Ç
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59
Tellurium(Te) Evaporation Material
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11-01-10
788
58
Calcium(Ca) Evaporation Material
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11-01-10
774
57
Zinc(Zn) Sputtering Target
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11-01-10
770
56
Germanium(Ge) Sputtering Target
°ü¸®ÀÚ
11-01-10
873
55
Germanium(Ge) Powder
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11-01-10
833
54
Germanium(Ge) Evaporation Material
°ü¸®ÀÚ
11-01-10
795
CdTe Sputtering Target
°ü¸®ÀÚ
11-01-10
1051
52
Boron(B) Evaporation Material
°ü¸®ÀÚ
11-01-10
1037
51
Tellurium(Te) Sputtering Target
°ü¸®ÀÚ
11-01-10
795
50
Molybdenum(Mo) Powder
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11-01-10
789
49
Aluminum(Al) Powder
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11-01-10
1014
48
Arsenic(As) MBE Source
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11-01-10
1001
47
Tungsten(W) Wire
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11-01-10
803
46
Molybdenum(Mo) Rod
°ü¸®ÀÚ
11-01-10
1021
45
CdS Sputtering Target
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11-01-10
1031
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